Curvilinear Mask Patterning is a cutting-edge lithography technique that promises to maximize lithography entitlement by addressing complex design challenges and critical yield limiters. However, its ...

Experts at the Table: As leading-edge lithography nodes push further into EUV and beyond, mask-making has become one of the most critical and costly aspects of semiconductor manufacturing. At the same ...

Eighteen years ago, things were not looking good for EUV. EUV is not shaping up as a method for making next generation ICs, and maybe not even for the subsequent generation, the 2007 System and SoC ...

Phase shift masks haven’t yet been produced for EUV lithography, but they could be. “So far it appears to be doable,” Abboud said. Jan van Schoot, director of system engineering at lithography tool ...

THE LIMITS OF LITHOGRAPHY The roadblock comes at one of the earliest steps of chip manufacture. In lithography, one first shines light on a photosensitive material to create a stencil-like "mask." ...

A team of scientists from research center ICFO and photonics materials manufacturer Corning has developed a new method for fabricating anti-reflective (AR) surfaces – achieved through nano-structured ...

China is also trying to build its own lithography tools. SMEE, a state-owned firm, is reportedly making progress on a machine capable of producing 28nm chips using DUV light. But developing an EUV ...

Controlled generation of single-photon emitters in silicon (red) by broad-beam implantation of ions (blue) through a lithographically defined mask (left) and by a scanned focused ion beam (right).

Research from all publishers Recent investigations have focused on enhancing the controllability and speed of the electrohydrodynamic patterning process. Studies have demonstrated that by refining ...