The fabrication of nanoscale devices increasingly relies on techniques that offer atomic‐scale precision, with Atomic Layer Deposition (ALD) and Area-Selective Deposition (ASD) at the forefront. ALD ...
Atomic layer etching (ALE) and atomic layer deposition (ALD) represent pivotal techniques in nanofabrication, enabling control of material removal and growth at the atomic scale. By utilising ...
A Japanese research team led by Professor Minoru Osada from the Institute for Materials and Systems for Sustainability (IMaSS) at Nagoya University has pioneered a groundbreaking method for the ...
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